Target Fabrication has the capabilitity to do a number of MEMS processes. Targets are produced using silicon wafer based etching techniques and are ideal for:
- Large numbers of targets for high-repetition rate experiments - usually as arrays
- Targets with micro and nano scale dimensions not possible with other fabrication techniques
- Target types include: micro-dot, multi-vane and ultra-low mass targets, thin foil assemblies and grating structures
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MEMS Target array
| Close-up of individual Target
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